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半导体学报 2008
Pattern Fabrication on PLZT Films and Their Properties by a Direct Patterning Process
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Abstract:
The photosensitive Pb0.91La0.09(Zr0.65Ti0.35)O3(PLZT)precursor sols are prepared by a modified sol-gel process with benzoylacetone as chemical modification to form a coordination chelate structure of metal-salt with PVP as an addition agent for suppressing film cracks.The patterns of PLZT gel films are prepared by direct patterning process and single dip-coating,and the PLZT film patterns with perovskite structure on Pt/TiO2/SiO2/Si substrate are obtained after heat-treatment.The PLZT film's pattern thickne...