Analysis and Realization of Nonvolatile Logic Circuits by Using Ferroelectric Technology
新型铁电不挥发性逻辑电路的分析和实现

A new technology of realization of nonvolatile logic circuits by using ferroelectric thin film which is compatible with CMOS processing is presented.The correct circuit simulation and testing results for experimental latch circuit and flip flop circuit illustrate that the new technology of ferroelectric nonvolatile logic circuits is feasible.