|
半导体学报 2002
Stress Analysis of Silica Optical Waveguide on Silicon by a Finite Element Method
|
Abstract:
Stress distribution in silicon based silica optical waveguide is calculated by using a finite element method.The waveguide is mainly subjected to compress stress along lateral direction,and the stress is accumulated near the interface between the core and the cladding layers.With the stress distribution,the mode index is calculated by the finite difference solution for the full vector waveguide equation based upon the alternating direction implicit (ADI) iterative method.The birefringence of the waveguide is mainly the stress induced birefringence,and the mode index is larger than that without considering the stress effect.