Study on Kinetic Process of Silicon Film Deposited by Laser Plasma
激光等离子体淀积硅薄膜过程动力学研究

The process of film deposition by laser plasma is studied.The energy of laser,gas pres-sure and temperature of substrate dependence of deposition rate are measured.At the same timethe basic kinetic process in deposition is studied by OES and OLDI. Finally, the model of de-position is suggested based on the experiment results.