Etching of CVD Diamond Thick Films by Rare-earth Compound Ink
稀土化合物浆料对CVD金刚石厚膜的刻蚀

CVD diamond with high electrical, optical and thermal quality has been used in many applications. However, its inert chemical nature and high temperature stability make it difficult to be processed. A highly available etching technique compatible with existing diamond processing is desirable. In this paper, CVD diamond thick films were etched with rare-earth compound ink prepared by the authors. The etching process is taken in the atmosphere at a temperature below the oxidation temperature of diamond. The technique uses inexpensive and safe rare-earth compound ink and the experimental results show that the processing is simple and efficient for polishing the CVD diamond thick films rapidly. The results were studied by SEM.