Molds for nanoimprinting made by modified photoresist
改性光刻胶制备纳米压印模版

The molds for nanoimprint is very important for nanoimprinting. Many hard materials have been used to make molds. But these materials are difficult to fabricate. In this paper we present a novel technique for making molds based on the modification of polymer by focused ion beam irradiation. This technique is very fast and simple. It can be used in many other domainus of nanofabrication.