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OALib Journal期刊
ISSN: 2333-9721
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Effect of chemical polish etching and post annealing on the performance of silicon heterojunction solar cells
化学抛光处理和低温退火对硅异质结太阳电池性能的影响

Keywords: HIT solar cells,chemical polishing,post annealing,HWCVD
异质结太阳电池,化学抛光,后退火,热丝化学气相沉积

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Abstract:

Amorphous/crystalline silicon heterostructure solar cells have been fabricated by hot wire chemical vapor deposition (HWCVD) on textured p-type substrates. The influence of chemical polish (CP) etching and the post annealing process on the solar cell perf

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