%0 Journal Article
%T The corrosion resistance and microstructure of UBM system-deposited Nb xSi yNz thin films
%A Velasco
%A L
%A Olaya
%A J. J
%A Rodr¨ªguez-Baracaldo
%A R
%J Ingenier¨ªa e Investigaci¨®n
%D 2012
%I Universidad Nacional de Colombia
%X nbxsiynz thin film nanostructure was grown using the unbalanced magnetron sputtering (ubm) technique with varying si content. corrosion resistance was evaluated by potentiodynamic polarisation technique in a 3% nacl solution. microstructure was analysed by x-ray diffraction (xrd), scanning electron microscopy (sem) and laser scanning microscopy. chemical composition was ascertained by x-ray fluorescence (xrf) technique. the results showed that deposition rates increased with higher si content. a micro-structural change was observed for greater than 5% si content through the transition from a crystalline to an amorphous structure in the thin films. corrosion test results demonstrated that the thin films having the highest silicon content had better corrosion resistance.
%K corrosion
%K diffraction
%K spectroscopy
%K fluorescence
%K microstructure
%K microscopy
%K race track
%K x ray
%K thin film
%K sputtering
%K polarisation.
%U http://www.scielo.org.co/scielo.php?script=sci_abstract&pid=S0120-56092012000300003&lng=en&nrm=iso&tlng=en