%0 Journal Article
%T Orientaci¨®n preferencial en nitruros met¨¢licos depositados con el sistema UBM
%A Olaya
%A Jhon Jairo
%A Marulanda
%A Diana Maritza
%A Rodil
%A Sandra
%J Ingenier¨ªa e Investigaci¨®n
%D 2010
%I Universidad Nacional de Colombia
%X this work was aimed at studying the influence of ion bombardment on the preferred orientation (op) of transition metal nitrides (tmn) produced by the reactive sputtering technique with a variable unbalanced magnetron through permanent magnets. titanium nitride (tin) coatings were thus studied by varying two parameters: ion-atom ratio on the substrate (ji/ja) and nitrogen flux. deposition conditions were as follows: 7 mtorr working pressure, ~ 380oc substrate temperature, 2 and 8.5 sccm nitrogen flux and 245-265 discharge power. the results showed that preferred orientation (111) and the crystalline behaviour of the produced coatings depended more on nitrogen flux than on ion bombardment. similarly, micro-hardness measured on films deposited on steel aisi-m2 substrates increased from 1600 to 2000 hv0.025 when nitrogen flux was increased.
%K metal nitride
%K unbalanced magnetron
%K ubm
%K reactive sputtering.
%U http://www.scielo.org.co/scielo.php?script=sci_abstract&pid=S0120-56092010000100021&lng=en&nrm=iso&tlng=en