%0 Journal Article
%T Electrical and Structural Properties of the Partial Ternary Thin-Film System Ni¨CSi¨CB
%J -
%D 2019
%R https://doi.org/10.1021/acscombsci.8b00175
%X High-throughput and combinatorial materials science methods were used to investigate the dependence of the work function in the Ni¨CSi system on the B content (0¨C30 at. %). Alloying of NiSi is used to adapt its properties to suit the needs as a gate electrode material. Thin-film materials libraries were fabricated and investigated with respect to their structural and electrical properties. Further the work function values of selected samples in the region of interest were analyzed. The results show that the work function can be adjusted between 4.86 eV (B = 4.2 at. %) and 5.16 eV (B = 29.2 at. %) for (NiSi)Bx
%U https://pubs.acs.org/doi/10.1021/acscombsci.8b00175