%0 Journal Article
%T Mechanically strengthened graphene-Cu composite with reduced thermal expansion towards interconnect applications
%J -
%D 2019
%R https://doi.org/10.1038/s41378-019-0059-0
%X High-density integration technologies with copper (Cu) through-silicon via (TSV) have emerged as viable alternatives for achieving the requisite integration densities for the portable electronics and micro-electro-mechanical systems (MEMSs) package. However, significant thermo-mechanical stresses can be introduced in integrated structures during the manufacturing process due to mismatches of thermal expansion and the mechanical properties between Cu and silicon (Si). The high-density integration demands an interconnection material with a strong mechanical strength and small thermal expansion mismatch. In this study, a novel electroplating method is developed for the synthesis of a graphene-copper (G-Cu) composite with electrochemically exfoliated graphenes. The fabrication and evaluation of the G-Cu composite microstructures, including the microcantilevers and micromirrors supported by the composite, are reported. We evaluated not only the micromechanical properties of the G-Cu composite based on in-situ mechanical resonant frequency measurements using a laser Doppler vibrometer but also the coefficients of thermal expansion (CTE) of the composite based on curvature radius measurements at a temperature range of 20¨C200£¿¡ãC. The Young¡¯s modulus and shear modulus of the composite are approximately 123 and 51£¿GPa, which are 1.25 times greater and 1.22 times greater, respectively, than those of pure Cu due to the reinforcement of graphene. The G-Cu composite exhibits a 23% lower CTE than Cu without sacrificing electrical conductivity. These results show that the mechanically strengthened G-Cu composite with reduced thermal expansion is an ideal and reliable interconnection material instead of Cu for complex integration structures
%U https://www.nature.com/articles/s41378-019-0059-0