%0 Journal Article
%T Preferential orientation in metal nitride deposited by the UBM system
%A Diana Maritza Marulanda
%A Jhon Jairo Olaya
%A Sandra Rodil
%J -
%D 2010
%X This work was aimed at studying the influence of ion bombardment on the preferred orientation (OP) of transition metal nitrides (TMN) produced by the reactive sputtering technique with a variable unbalanced magnetron through permanent magnets. Tita- nium nitride (TiN) coatings were thus studied by varying two parameters: ion-atom ratio on the substrate (Ji/Ja) and nitrogen flux. Deposition conditions were as follows: 7 mTorr working pressure, ~ 380oC substrate temperature, 2 and 8.5 sccm nitrogen flux and 245-265 discharge power. The results showed that preferred orientation (111) and the crystalline behaviour of the produced coatings depended more on nitrogen flux than on ion bombardment. Similarly, micro-hardness measured on films deposited on steel AISI-M2 substrates increased from 1600 to 2000 HV0.025 when nitrogen flux was increased
%K metal nitride
%K unbalanced magnetron
%K UBM
%K reactive sputtering
%U https://revistas.unal.edu.co/index.php/ingeinv/article/view/15220