%0 Journal Article
%T Atomic layer deposited V2O5 coatings: a promising cathode for Li-ion batteries
%A Pemble
%A Martyn
%A Povey
%A Ian
%A Vernardou
%A Dimitra
%J -
%D 2020
%R 10.5599/jese.708
%X Sa£¿etak A modified, thermal atomic layer deposition process was employed for the pulsed chemical vapour deposition growth of vanadium pentoxide films using tetrakis (dimethylamino) vanadium and water as a co-reagent. Depositions were carried out at 350 ¡ãC for 400 pulsed CVD cycles, and samples were subsequently annealed for 1hour at 400 ¡ãC in air to form materials with enhanced cycling stability during the continuous lithium-ion intercalation/deintercalation processes. The diffusion coefficients were estimated to be 2.04x10-10 and 4.10x10-10 cm2 s-1 for the cathodic and anodic processes, respectively. These values are comparable or lower than those reported in the literature, indicating the capability of Li+ of getting access into the vanadium pentoxide framework at a fast rate. Overall, it presents a specific discharge capacity of 280 mA h g-1, capacity retention of 75 % after 10000 scans, a coulombic efficiency of 100 % for the first scan, dropping to 85 % for the 10000th scan, and specific energy of 523 W h g-1
%K Pulsed-CVD
%K vanadium pentoxide
%K Li+intercalation/deintercalation
%K cyclic voltammetry
%K cycling stability
%K electron transport properties
%U https://hrcak.srce.hr/index.php?show=clanak&id_clanak_jezik=333619