%0 Journal Article
%T Interface Science Using Ambient Pressure Hard X-ray Photoelectron Spectroscopy
%J Surfaces | An Open Access Journal from MDPI
%D 2019
%R https://doi.org/10.3390/surfaces2010008
%X The development of novel in situ/operando spectroscopic tools has provided the opportunity for a molecular level understanding of solid/liquid interfaces. Ambient pressure photoelectron spectroscopy using hard X-rays is an excellent interface characterization tool, due to its ability to interrogate simultaneously the chemical composition and built-in electrical potentials, in situ. In this work, we briefly describe the ˇ°dip and pullˇ± method, which is currently used as a way to investigate in situ solid/liquid interfaces. By simulating photoelectron intensities from a functionalized TiO 2 surface buried by a nanometric-thin layer of water, we obtain the optimal photon energy range that provides the greatest sensitivity to the interface. We also study the evolution of the functionalized TiO 2 surface chemical composition and correlated band-bending with a change in the electrolyte pH from 7 to 14. Our results provide general information about the optimal experimental conditions for characterizing the solid/liquid interface using the ˇ°dip and pullˇ± method, and the unique possibilities offered by this technique. View Full-Tex
%U https://www.mdpi.com/2571-9637/2/1/8