%0 Journal Article
%T Optimizing Silicon Oxide Embedded Silicon Nanocrystal Inter-particle Distances
%A Frans D. Tichelaar
%A Jim Quik
%A Jort Allebrandi
%A Martijn van Sebille
%A Miro Zeman
%A Ren¨¦ A.C. M. M. van Swaaij
%J Archive of "Nanoscale Research Letters".
%D 2016
%R 10.1186/s11671-016-1567-6
%X We demonstrate an analytical method to optimize the stoichiometry and thickness of multilayer silicon oxide films in order to achieve the highest density of non-touching and closely spaced silicon nanocrystals after annealing. The probability of a nanocrystal nearest-neighbor distance within a limited range is calculated using the stoichiometry of the as-deposited film and the crystallinity of the annealed film as input parameters. Multiplying this probability with the nanocrystal density results in the density of non-touching and closely spaced silicon nanocrystals. This method can be used to estimate the best as-deposited stoichiometry in order to achieve optimal nanocrystal density and spacing after a subsequent annealing step
%K Silicon nanocrystal
%K Silicon oxide
%K Inter-particle distance
%K Stoichiometry
%K Spacing
%U https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4974215/