%0 Journal Article
%T Reduced Contact Resistance Between Metal and n-Ge by Insertion of ZnO with Argon Plasma Treatment
%A Chang Liu
%A Genquan Han
%A Haihua Zheng
%A Hao Wu
%A Huan Liu
%A Jincheng Zhang
%A Xiao Wang
%A Xue Chen
%A Yan Liu
%A Yi Zhang
%A Yue Hao
%J Archive of "Nanoscale Research Letters".
%D 2018
%R 10.1186/s11671-018-2650-y
%X XPS spectra for valence bands of ZnO/Ge sample. a Zn 2p and b valence band spectra for thick ZnO sample c ZnO 2p and d Ge 3d spectra for ZnO/Ge interface sample, and e Ge 3d and f valence band spectra for bulk Ge sampl
%K Germanium
%K Fermi-level pinning
%K Ohmic contact
%K Argon plasma
%K ZnO
%U https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6093824/