%0 Journal Article
%T Nanostructure of Rutile TiO<sub>2</sub> Thin Films Prepared on Unheated Substrate by Dual Cathode DC Unbalanced Magnetron Sputtering
%A Wichai Kongsri
%A Supanee Limsuwan
%A Surasing Chaiyakun
%A Pichet Limsuwan
%A Chittra Kedkaew
%J Materials Sciences and Applications
%P 216-226
%@ 2153-1188
%D 2019
%I Scientific Research Publishing
%R 10.4236/msa.2019.103018
%X In this
work, structural and optical properties of the TiO<sub>2</sub> films deposited
on unheated substrates by dual cathode dc unbalanced magnetron sputtering at
long substrate-target distance (d<sub>s-t</sub>) were studied. Titanium dioxide
(TiO<sub>2</sub>) thin films were deposited on unheated Si (110) wafers, glass
slides and carbon coated copper grids at different substrate to target (d<sub>s-t</sub>)
distances. The structural properties of TiO<sub>2</sub> thin films were
characterized by X-ray diffraction (XRD) and transmission electron microcopy
(TEM) with selected-area electron diffraction (SAED), surface morphology using
atomic force microscopy (AFM) and optical transmission spectra using a
spectrophotometer. XRD results show that TiO<sub>2</sub> films deposited at
various d<sub>s-t</sub> distances have only rutile crystal structure. The
crystallinity and thickness of the films increased while the roughness
decreased with decreasing d<sub>s-t</sub> distance. The refractive indices of
the deposited films were found to be in the range of 2.51 - 2.82
and increased with decreasing d<sub>s-t</sub> distance.
%K TiO&lt
%K sub&gt
%K 2&lt
%K /sub&gt
%K Magnetron Sputtering
%K Rutile
%U http://www.scirp.org/journal/PaperInformation.aspx?PaperID=91345