%0 Journal Article
%T 扫描干涉光刻机光束位姿自动准直系统设计<br>Design of beam pose automatic alignment system for an interference lithography scanner
%A 朱煜
%A 王磊杰
%A 张鸣
%A 祁利山
%J 清华大学学报（自然科学版）
%D 2015
%X 针对扫描干涉光刻机对干涉光束的高精度位姿准直需求, 设计了高精度光束自动准直系统; 基于该系统提出了利用每步迭代调节后的位姿实测值作为下一步迭代的起始值进行迭代准直和正交平面内位姿交替准直的光束位姿迭代准直策略, 解决了迭代过程误差积累问题和正交平面内电机耦合问题。实验结果显示: 该光束自动准直系统能够实现两个位置准直精度均优于5 μm和两个角度准直精度均优于3 μrad, 满足扫描干涉光刻机光束位姿准直精度需求。<br>Abstract：An accurate automatic beam alignment system is designed for beam alignment in an interference lithography scanner. The iterative alignment system uses the previously measured value in the next iteration step for the iterative alignment procedure that iterates the beam alignment in two orthogonal planes. The alignment procedure then compensates for the error accumulation and pico-motor coupling in the two orthogonal plane. Tests demonstrate that the position and angle accuracy of this automatic beam alignment system with four degrees of freedom are better than 5 μm and 3 μrad, which satisfies the alignment requirements for an interference lithography scanner.
%K 光束自动准直
%K 迭代准直策略
%K 扫描干涉光刻机
%K &lt
%K br&gt
%K beam automatic alignment
%K iteration alignment strategy
%K interference lithography scanner
%U http://jst.tsinghuajournals.com/CN/Y2015/V55/I7/716#MetricsTab