%0 Journal Article
%T 用分子束外延法生长的立方相ZnxMg1-xO薄膜的性质研究
Investigation of Cubic ZnxMg1-xO Films Grown by Molecular Beam Epitaxy
%A 王小丹
%A 周华
%A 耿伟
%A 康煜堃
%A 陈晓航
%A 王惠琼
%A 周颖慧
%A 詹华瀚
%A 康俊勇
%J Material Sciences
%P 79-84
%@ 2160-7621
%D 2015
%I Hans Publishing
%R 10.12677/MS.2015.53011
%X
通过分子束外延(MBE)的技术, 在富镁条件下于立方结构的MgO(100)衬底上外延生长立方相的ZnxMg1?xO薄膜。用反射高能电子衍射(RHEED)和X射线衍射(XRD)的方法研究了薄膜的晶体结构,结果表明,薄膜结构为四方相。用硬X射线吸收谱(XAS)的方法研究薄膜的电子结构,用透射谱的方法研究了薄膜的带隙结构;研究表明,ZnxMg1?xO薄膜中x的值约为0.58。
The cubic ZnxMg1?xO films are prepared epitaxially on cubic MgO(100) substrates by Molecular Beam Epitaxy (MBE). The crystal structure is determined by Reflection High Energy Electron Di-fraction (RHEED) which indicates that the phase of the film is cubic structure, consistent with the observation of the X-ray diffraction (XRD) results. The electronic structure is studied by X-ray Ab-sorption Spectroscopy (XAS); the band-gap structure is demonstrated by transmission spectroscopy. It is indicated that the value of x in ZnxMg1?xO films is about 0.58.
%K ZnxMg1-xO薄膜,MgO衬底,立方结构
ZnxMg1-xO Film
%K MgO Substrate
%K Cubic Structure
%U http://www.hanspub.org/journal/PaperInformation.aspx?PaperID=15199