%0 Journal Article
%T Plasma Enhanced-Chemical Vapour Deposition of Scuff-Resistant Hydrogenated Amorphous Carbon Coatings on C100 Steel
%A Nicoletta De Vietro
%A Gianluigi Intonti
%A Francesco Fracassi
%A Gianluca Quarta
%A Lucio Maruccio
%A Lucio Calcagnile
%J Journal of Surface Engineered Materials and Advanced Technology
%P 131-139
%@ 2161-489X
%D 2014
%I Scientific Research Publishing
%R 10.4236/jsemat.2014.43017
%X <p>
	<span style=\"font-size:12px;font-family:Verdana;\">Hydrogenated amorphous carbon
coatings, deposited by low pressure plasma to minimize the wear of C100 steel
components, were optimized and characterized. In order to ensure good adhesion
of the films to the steel surface, a thin Ti interlayer was deposited, by
magnetron sputtering, before the plasma deposition. The chemical
characterization of the deposits was performed by means of RAMAN, XPS, RBS and
ERDA analysis, while nanoindentation, nanoscratch and nanowear tests allowed to
estimating the tribomechanical properties of the deposits, with the aim of evaluating their scuff-resistance. It was found that the optimized plasma
deposited hydrogenated amorphous carbon coatings were well adherent to C100
steel and increased more than 70% its surface hardness.</span>
</p>
%K PE-CVD
%K C100 Steel
%K Scuff-Resistant a-C:H Coatings
%U http://www.scirp.org/journal/PaperInformation.aspx?PaperID=45376