%0 Journal Article
%T Photomasks Fabrication Based on Optical Reduction for Microfluidic Applications
%A Emanuele Orabona
%A Alessandro Cali¨°
%A Ivo Rendina
%A Luca De Stefano
%A Mario Medugno
%J Micromachines
%D 2013
%I MDPI AG
%R 10.3390/mi4020206
%X A procedure for fabrication of photomasks on photographic films with minimum feature achievable of about 20 ¦̀m, which are particularly suitable for the fast prototyping of microfluidic devices, has been improved. We used a commercial photographic enlarger in reverse mode obtaining 10:1 reduction factor with error less than 1%. Masks have been characterized by optical transmission measurement and contact profilometry: the exposed region completely absorbs light in the wavelength region explored, while the non-exposed region is transparent from 350 nm on; the average film thickness is of 410 nm and its roughness is about 120 nm. A PDMS microfluidic device has been realized and tested in order to prove the effectiveness of designed photomasks used with the common UV light box.
%K microfluidic
%K optical reduction
%K photomasks
%U http://www.mdpi.com/2072-666X/4/2/206