%0 Journal Article
%T Changing of Defect¡¯s Structure and Properties of Superhard Nanostructured Ti-Si-N Coatings, Fabricated Using CPVD, before and after Annealing
%A Alexander D. Pogrebnjak
%A Oleksandr V. Bondar
%A Oleg V. Sobol
%A Vyacheslav M. Beresnev
%J Soft Nanoscience Letters
%P 46-51
%@ 2160-0740
%D 2013
%I Scientific Research Publishing
%R 10.4236/snl.2013.33009
%X <p class=\"MsoNormal\">
	<span lang=\"EN-US\">Using such unique methods of analysis as slow positron beam (SPB), RBS, <i>¦Ì</i>-PIXE (proton microbeam), XRD, SEM with EDS, XPS, nanohardness and elastic modulus measurements, we studied superhar<span style=\"letter-spacing:-0.1pt;\">d nanostructure Ti-Si-N coatings,</span> which were deposited using Cathodic-PVD method, before and after annealing at the temperature of 600<span style=\"white-space:nowrap;\">¡ã</span>C for 30 min</span><span lang=\"EN-US\">utes. It is shown in the paper that redistribution of N and Si occurs on the borders of nanograins after annealing, amor</span><span lang=\"EN-US\">phous phase <i>¦Á</i>-SiN<sub>x</sub> (Si<sub>3</sub>N<sub>4</sub>) is created, defects segregates on interfaces and forms vacancy-type clusters with rather high concentration from 5</span><span lang=\"EN-US\"> </span><span lang=\"EN-US\">¡Á</span><span lang=\"EN-US\"> </span><span lang=\"EN-US\">10<sup>16</sup> cm<span style=\"line-height:12px;white-space:normal;font-size:x-small;\"><sup>-3</sup></span> to 7.5</span><span lang=\"EN-US\"> </span><span lang=\"EN-US\">¡Á</span><span lang=\"EN-US\"> </span><span lang=\"EN-US\">10<sup>17</sup> cm<span style=\"font-size:xx-small;\"><span style=\"line-height:12px;\"><sup>-3</sup></span></span> due to thermodiffusion. Solid solution (Ti,Si)N and small concentration of<i> ¦Á</i>-SiN (close to XRD detection limits) are formed in the coating. Also it was obtained, that deflected mode is formed in the coating (compressive deformation equals to ¨C2.6%), but after thermal annealing deformation reduces to a value of</span><span lang=\"EN-US\"> -</span><span lang=\"EN-US\">2.3%. Size of nanograins of solid solution (Ti,</span><span lang=\"EN-US\"> </span><span lang=\"EN-US\">Si)N increases from 12.5 nm to (13.2</span><span lang=\"EN-US\"> </span><span lang=\"EN-US\">¡Â</span><span lang=\"EN-US\"> </span><span lang=\"EN-US\">13.4) nm. 25 nm size grains increase their size to 28.5 nm after annealing (under another deposition regime).</span><span lang=\"EN-US\"><?xml:namespace prefix = o /><o:p></o:p></span> 
</p>
%K Nanostructure
%K Wear
%K Nanohardness
%K Profiles of Defects
%K Ti-Si-N
%U http://www.scirp.org/journal/PaperInformation.aspx?PaperID=34627