%0 Journal Article
%T Methyl Termination and ATR-FTIR Evaluation of n-Si(111) Electrode towards Photoelectrochemical Cell Fabrication
%A Toshihito Ohtake
%J Journal of Surface Engineered Materials and Advanced Technology
%P 169-171
%@ 2161-489X
%D 2013
%I Scientific Research Publishing
%R 10.4236/jsemat.2013.33022
%X <p class=\"MsoNormal\">
	<span lang=\"EN-US\" style=\"font-family:Verdana;\">We confirmed methyl termination on
n-Si(111) surface by ATR-FTIR measurement, which was fabricated by a photo
chloro-reaction and its methylation. The coverage of the methylation was about
63.7%, and the surface was not re-ter</span><span lang=\"EN-US\" style=\"font-family:Verdana;\">minated by hydrogen. Photoelectrochemical properties of the n-Si(111) w</span><span lang=\"EN-US\" style=\"font-family:Verdana;\">ere</span><span lang=\"EN-US\" style=\"font-family:Verdana;\"> measured as an electrode for a photoelec</span><span lang=\"EN-US\" style=\"font-family:Verdana;\">trochemical cell, and an onset
potential obtaining photocurrent for the methyl terminated n-Si(111) electrode
was ob</span><span lang=\"EN-US\" style=\"font-family:Verdana;\">served as
negative shift at 70 mV comparing with that of the hydrogen terminated
n-Si(111) electrode. Therefore, the negative shift would be expected for
improving open circuit voltage towards solar cell.</span><span lang=\"EN-US\"> </span><span lang=\"EN-US\"><o:p></o:p></span> 
</p>
%K Methyl Termination
%K ATR-FTIR
%K Semiconductor Electrode
%K Si
%K Photoelectrochemical Cell
%U http://www.scirp.org/journal/PaperInformation.aspx?PaperID=34217