%0 Journal Article
%T Morphology change of the silicon surface induced by Ar+ ion beam sputtering
%A V.O. Kharchenko
%A D.O. Kharchenko
%J Condensed Matter Physics
%D 2011
%I Institute for Condensed Matter Physics
%X Two-level modeling for nanoscale pattern formation on silicon target by Ar+ ion sputtering is presented. Phase diagram illustrating possible nanosize surface patterns is discussed. Scaling characteristics for the structure wavelength dependence versus incoming ion energy are defined. Growth and roughness exponents in different domains of the phase diagram are obtained.
%K ion-beam sputtering
%K surface morphology
%K nanoscale structures
%U http://dx.doi.org/10.5488/CMP.14.23602