%0 Journal Article
%T Effect of Plused Negative Bias on Nucleation and Morphological Evolution of ZnO Films Deposited by Reactive Radio-frequency Magnetron Sputtering
%A FU Wei-Jia
%A LIU Zhi-Wen
%A GU Jian-Feng
%A LIU Ming
%A ZHANG Qing-Yu
%J 无机材料学报
%D 2009
%I Science Press
%R 10.3724/sp.j1077.2009.00602
%X Using reactive radioa2frequency magnetron sputtering, ZnO films were deposited on Si (001) substrates with plused negative bias. The atomic force microscopy was used to study the morphological evolution of ZnO films. The nucleation and growth behavior of the films are quantitatively characterized with the dynamic scaling theory. It is found that the island density of ZnO films increases and the grain size decreases with the increase of deposition time. Compared with the film depositions without bias, the stage of low-rate nucleation disappears due to the application of plused negative bias. The growth exponents of the nativea2defect nucleation and the iona2bombardment defect nucleation are determined to be (0.45  .03) and (0.22  .04), respectively. With the voltage of plused negative bias increasing, the island sizes and the roughness increase and the preferred orientation of the films is changed.
%K ZnO films
%K reactive radio-frequency magnetron sputtering
%K bias
%K morphological analysis
%U http://www.jim.org.cn/fileup/PDF/20090338.pdf