%0 Journal Article
%T Modeling and identification study of the variation of dynamic pressure
%A Papp S¨¢ndor
%A Jakab-Farkas L¨¢szl¨®
%A Bir¨® Dominic
%A Szabo Willibald
%J Scientific Bulletin of the ''Petru Maior" University of T£¿rgu Mure£¿
%D 2011
%I Editura Universit??ii "Petru Maior"
%X Automatic control of reactive sputtering process involves controlling the state of the electrical discharge plasma and the definition of control variables. Obtaining a thin film with a determined constant structure and composition, involves maintaining in every part of the substrate and at all time of the deposition process a constant number of collisions, i.e. activated plasma density. This condition is greatly hampered by the dynamics of surface phenomena that occur at the sputtered target.
%K dynamic pressure
%K modeling and identification
%K reactive sputtering process
%U http://scientificbulletin.upm.ro/papers/2011/12/Papp-S%C3%A1ndor-Jakab-Farkas-L%C3%A1szl%C3%B3-Bir%C3%B3-Dominic-Szabo-Willibald-Modeling-and-identification-study-of-the-variation-of-dynamic-pressure1.pdf