%0 Journal Article
%T Simple and cost-effective fabrication of size-tunable zinc oxide architectures by multiple size reduction technique
%A Hyeong-Ho Park
%A Xin Zhang
%A Seon-Yong Hwang
%A Sang Hyun Jung
%A Semin Kang
%A Hyun-Beom Shin
%A Ho Kwan Kang
%A Hyung-Ho Park
%A Ross H Hill and Chul Ki Ko
%J Science and Technology of Advanced Materials
%D 2012
%I Institute of Physics, National Institute for Materials Science
%X We present a simple size reduction technique for fabricating 400 nm zinc oxide (ZnO) architectures using a silicon master containing only microscale architectures. In this approach, the overall fabrication, from the master to the molds and the final ZnO architectures, features cost-effective UV photolithography, instead of electron beam lithography or deep-UV photolithography. A photosensitive Zn-containing sol¨Cgel precursor was used to imprint architectures by direct UV-assisted nanoimprint lithography (UV-NIL). The resulting Zn-containing architectures were then converted to ZnO architectures with reduced feature sizes by thermal annealing at 400 ˇăC for 1 h. The imprinted and annealed ZnO architectures were also used as new masters for the size reduction technique. ZnO pillars of 400 nm diameter were obtained from a silicon master with pillars of 1000 nm diameter by simply repeating the size reduction technique. The photosensitivity and contrast of the Zn-containing precursor were measured as 6.5 J cm 2 and 16.5, respectively. Interesting complex ZnO patterns, with both microscale pillars and nanoscale holes, were demonstrated by the combination of dose-controlled UV exposure and a two-step UV-NIL.
%U http://iopscience.iop.org/1468-6996/13/2/025003