%0 Journal Article
%T Plasma Immersion Ion Implantation (PIII) Process - Physics and Technology
%A Dushyant Gupta
%J International Journal of Advancements in Technology
%D 2011
%I IJoAT Foundation
%X Plasma Immersion Ion Implantation (PIII) is a versatile process technology with its vast applications in materials engineering and microelectronics processing. This paper reviews first, a brief historical aspect of conventional ion implantation and Plasma Immersion ion implantation, followed by their comparison. Then the basic mechanism of a PIII technique and the physics of sheath dynamics developed in such a system is discussed together with necessary plasma specifications in a PIII process. Finally the main components of a PIII system, the existing trends and future prospects of this promising process technique are discussed.
%K electronics
%K Plasma immersion ion implantation
%K conventional ion implantation
%K ion matrix sheath
%K Child-law sheath
%K ion plasma frequency
%K pulse generator system
%U http://ijict.org/index.php/ijoat/article/view/347