%0 Journal Article
%T Femtosecond laser-induced damage in dielectrics
%A ufeng Peng
%A Yaoli Wei
%A Zhenlong Lv
%J Optica Applicata
%D 2004
%I 
%X We present a new method to investigate the ablation phenomenon by a 100 fs, 1053 nm Gaussian laser pulse in fused silica and describe the different mechanisms of ablation in long pulse and ultrashort pulse lasers. A modified rate equation is used to numerically calculate damage in dielectrics. In addition, we examine the respective role of ionization and avalanche ionization in femtosecond laser-induced damage. We find that present results are in quantitative agreement with those of earlier study.
%K femtosecond laser
%K ablation mechanism
%K damage threshold
%K electron number density
%U http://www.if.pwr.wroc.pl/~optappl/pdf/2004/no3/optappl_3403p319.pdf