%0 Journal Article
%T Energy meter system for gas-puff laser plasma
%A Zbigniew Bielecki
%A Janusz Mikolajczyk
%J Optica Applicata
%D 2007
%I 
%X The authors demonstrate a detection system of EUV radiation pulses. The system provides energy measurements with uncertainty of 7.3% in the range of wavelengths 13.5 ¡À 0.5 nm (FWHM = 7.3%). The calibration of the system was taken using the E-Mon commercial meter and a laser-plasma source. The procedures made it possible to determine a calibration factor for the laser-plasma source with helium-xenon gas puff target. The factor is exploited for the purpose of standardizing measurements of EUV radiation with FWHM = 2%. A substantial improvement in the system responsivity is demonstrated.
%K EUV radiation
%K EUV energy meter
%K nanolithography
%U http://www.if.pwr.wroc.pl/~optappl/pdf/2007/no12/optappl_3712p83.pdf