%0 Journal Article
%T Scratching Test and Its Finite Element Simulation for Estimating Adhesion between TiN Film and Substrate<br>评估TiN薄膜与基材结合的划痕试验及有限元模拟
%A YANG Hong-gang
%A LI Shu
%A DUAN De-li
%A <br>杨洪刚
%A 李曙
%A 段德莉
%J 摩擦学学报
%D 2009
%I 
%X The finite element simulation for scratching test showed that undulant variation of shear stress , difference of shear stress at interface of film / substrate , surface tensile stress around contact region , several concentrations under high loading etc . played important roles on failure of film / substrate . The difference of shear stress between film and substrate near interface , which was calculated by the FEM simulation at critical load of scratching test , could be used as a criterion for estimating adhesive strength . Two mechanisms of failure of film / substrate system in scratching test have been suggested . The validity of the FEM simulation has been confirmed by the result of scratching test to TiN film deposited on different substrate . The critical load resulted from synthetic effect of film / substrate system performance , such as adhesion strength , load bearing capacity , cohesion strength . The limitation of estimating adhesive strength of film / substrate by critical load in scratching test further proved by results of friction and wear test in reciprocating sliding under low loading .
%K scratching test
%K adhesive strength
%K finite element simulation
%K stress distribution
%K critical loading<br>划痕试验
%K 膜/基结合
%K 有限元模拟
%K 应力分布
%K 临界载荷
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=6E709DC38FA1D09A4B578DD0906875B5B44D4D294832BB8E&cid=5D344E2AD54D14F8&jid=2F467A5C6371C830162AAA01D7DAD07A&aid=B39CEE452174DBD608A1B65DBB39B802&yid=DE12191FBD62783C&vid=771469D9D58C34FF&iid=B31275AF3241DB2D&sid=106103EB0EA31435&eid=4158386E7B9422C8&journal_id=1004-0595&journal_name=摩擦学学报&referenced_num=0&reference_num=0