%0 Journal Article
%T Effect of Ion Implantation on the Interface Chemical States a nd Tribological Behavior of Amorphous Carbon Film on SiO2 Substrate
离子注入对SiO2表面非晶碳薄膜的化学状态及摩擦学性能的影响
%A XUE Qun-ji
%A
徐洮
%A 杨生荣
%A 齐尚奎 吕晋军
%A 薛群基
%J 摩擦学学报
%D 2001
%I
%X 采用真空蒸镀法在SiO
%K 离子束混合
%K 非晶碳薄膜
%K 摩擦学性能
%K 离子注入
%K 结合强度
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=6E709DC38FA1D09A4B578DD0906875B5B44D4D294832BB8E&cid=5D344E2AD54D14F8&jid=2F467A5C6371C830162AAA01D7DAD07A&aid=A24864E1D45017F5&yid=14E7EF987E4155E6&vid=659D3B06EBF534A7&iid=CA4FD0336C81A37A&sid=B31275AF3241DB2D&eid=9CF7A0430CBB2DFD&journal_id=1004-0595&journal_name=摩擦学学报&referenced_num=5&reference_num=7