%0 Journal Article %T Effect of Ion Implantation on the Interface Chemical States a nd Tribological Behavior of Amorphous Carbon Film on SiO2 Substrate
离子注入对SiO2表面非晶碳薄膜的化学状态及摩擦学性能的影响 %A XUE Qun-ji %A
徐洮 %A 杨生荣 %A 齐尚奎 吕晋军 %A 薛群基 %J 摩擦学学报 %D 2001 %I %X 采用真空蒸镀法在SiO %K 离子束混合 %K 非晶碳薄膜 %K 摩擦学性能 %K 离子注入 %K 结合强度 %U http://www.alljournals.cn/get_abstract_url.aspx?pcid=6E709DC38FA1D09A4B578DD0906875B5B44D4D294832BB8E&cid=5D344E2AD54D14F8&jid=2F467A5C6371C830162AAA01D7DAD07A&aid=A24864E1D45017F5&yid=14E7EF987E4155E6&vid=659D3B06EBF534A7&iid=CA4FD0336C81A37A&sid=B31275AF3241DB2D&eid=9CF7A0430CBB2DFD&journal_id=1004-0595&journal_name=摩擦学学报&referenced_num=5&reference_num=7