%0 Journal Article
%T Correlation between structure and hardness of magnetron sputtering deposited CN_x films<br>
%A Weitao Zheng
%A Haibo Li
%A Yuming Wang
%A J -E Sundgren
%A <br>
%J 科学通报(英文版)
%D 1999
%I 
%X Carbon nitride films are deposited on Si (001) substrates by reactive dc magnetron sputtering graphite in a pure N2discharge. The structure of carbon nitride films has been probed using Fourier transformation infrared, near edge X-ray absorption fine structure (NEXAFS) and high resolution electron microscopy (HREM), and the hardness has been evaluated in nanoin-dentation experiments. FTIR spectra show that N atoms are bound to sp1, sp2, and sp3 hybridized C atoms. Cls NEXAFS spectra show that the intensity of π resonance is the lowest for the film grown at substrate temperatureT s = 350°C, with a turbostratic-like structure and high hardness, while it is the highest for the film grown atT s = 100°C, with an amorphous structure and low hardness. The correlation between the structure and hardness of carbon nitride films has been discussed.
%K carbon nitride films
%K structure
%K hardness<br>
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=01BA20E8BA813E1908F3698710BBFEFEE816345F465FEBA5&cid=96E6E851B5104576C2DD9FC1FBCB69EF&jid=DD6615BC9D2CFCE0B6F945E8D5314523&aid=E1CC558A62ABFB86BD7D41B54873BC9B&yid=B914830F5B1D1078&vid=1AE5323881A5ECDC&iid=59906B3B2830C2C5&sid=1529CB0C2A6A7E90&eid=1529CB0C2A6A7E90&journal_id=1001-6538&journal_name=科学通报(英文版)&referenced_num=0&reference_num=9