%0 Journal Article
%T ¡°Microstructured Nanostructures¡± ¨C Nanostructuring by Means of Conventional Photolithography and Layer-expansion Technique
%A Johannes Platen
%A Arshak Poghossian
%A Michael J. Sch£¿ning
%J Sensors
%D 2006
%I MDPI AG
%R 10.3390/s6040361
%X A new and simple method for nanostructuring using conventionalphotolithography and layer expansion or pattern-size reduction technique is presented, whichcan further be applied for the fabrication of different nanostructures and nano-devices. Themethod is based on the conversion of a photolithographically patterned metal layer to ametal-oxide mask with improved pattern-size resolution using thermal oxidation. With thistechnique, the pattern size can be scaled down to several nanometer dimensions. Theproposed method is experimentally demonstrated by preparing nanostructures with differentconfigurations and layouts, like circles, rectangles, trapezoids, ¡°fluidic-channel¡±-,¡°cantilever¡±- and meander-type structures.
%K Nanostructuring
%K layer expansion
%K pattern-size reduction
%K self-aligned patterning.
%U http://www.mdpi.com/1424-8220/6/4/361