%0 Journal Article
%T Effects of Varied Cleaning Methods on Ni-5% W Substrate for Dip-Coating of Water-based Buffer Layers: An X-ray Photoelectron Spectroscopy Study
%A Vyshnavi Narayanan
%A Els Bruneel
%A Ruben H¨¹hne
%A Isabel Van Driessche
%J Nanomaterials
%D 2012
%I MDPI AG
%R 10.3390/nano2030251
%X This work describes various combinations of cleaning methods involved in the preparation of Ni-5% W substrates for the deposition of buffer layers using water-based solvents. The substrate has been studied for its surface properties using X-ray photoelectron spectroscopy (XPS). The contaminants in the substrates have been quantified and the appropriate cleaning method was chosen in terms of contaminants level and showing good surface crystallinity to further consider them for depositing chemical solution-based buffer layers for Y 1Ba 2Cu 3O y (YBCO) coated conductors.
%K X-ray photoelectron spectroscopy
%K cleaning of Ni-5% W substrate
%K depth profile studies
%K thin films and coatings
%U http://www.mdpi.com/2079-4991/2/3/251