%0 Journal Article
%T OPTICAL CHARACTERIZATION OF TiO2 THIN FILM ON SILICON SUBSTRATE DEPOSITED BY DC REACTIVE MAGNETRON SPUTTERING
%A HQ Wang
%A HShen
%A DC Ba
%A BWWang
%A LSWen
%A DChen
%A <br>
%J 金属学报(英文版)
%D 2005
%I 
%X TiO2 thin film has attracted considerable attention in recent years, due to its different refractive index and transparency with amorphous and different crysta ls in the visible and near-infrared wavelength region, high dielectric constant, wide band gap, high wear resistance and stability, etc, for which make it being used in many fields. This paper aims to investigate the optical characterizatio n of thin film TiO2 on silicon wafer. The TiO2 thin films were prepared by DC re active magnetron sputtering process from Ti target. The reflectivity of the film s was measured by UV-3101PC, and the index of refraction (n) and extinction coef ficient (k) were measured by n & k Analyzer 1200.
%K optical characterization
%K TiO2 thin film
%K DC reactive magnetron sputtering
%K n & k<br>光学特征
%K 二氧化钛薄膜
%K DC反应磁溅射
%K 生长工艺
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=AB188D3B70B071C57EB64E395D864ECE&jid=C19B08D052F5FD8445F4BB80A1A5D7BF&aid=2BD3E37AC5A97EC25260B16281C42795&yid=2DD7160C83D0ACED&vid=13553B2D12F347E8&iid=38B194292C032A66&sid=5D9D6A8FC2C66FD8&eid=FEF02B4635FE8227&journal_id=1006-7191&journal_name=金属学报(英文版)&referenced_num=1&reference_num=21