%0 Journal Article
%T PREPARATION OF IODINE-INCLUDED CARBON USING RF PLASMA CVD
%A Y Sakamoto
%A M Takaya
%A TUchiyama
%A <br>Y.Sakamoto
%A M.Takaya
%A T.Uchiyama
%J 金属学报(英文版)
%D 2005
%I 
%X For the aim of synthesis of the carbon-iodine compound, the preparation of iodin e-included carbon using RF plasma CVD was studied. Iodine-included carbon was sy nthesized on Si substrate using ICP type RF plasma CVD apparatus. C2H5OH and I2 dissolved C2H5OH was used as reactant gases. As a result, surface morphologies o f Iodine included carbon films showed flat surfaces for each samples. On the str ucture of films estimated by Raman spectroscopy, amorphous carbon was recognized . And I2 peaks were observed in XPS spectra. As a result of friction test, frict ion coefficient of the sample growth with C2H5OH showed about 0.45. On the other hand, that of the sample with I2-C2H5OH showed about 0.3 and decrease of fricti on coefficient was recognized. Iodine inclusion for carbon materials can be achi eved by RF plasma CVD using an I2-C2H5OH reactant. The coefficient of iodine-inc luded carbon showed lower than of without iodine
%K carbon
%K iodine
%K plasma CVD
%K tribological property<br>碳
%K 碘
%K 等离子体化学气相淀积
%K 摩擦性质
%K 功能材料
%K 薄膜生长
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=AB188D3B70B071C57EB64E395D864ECE&jid=C19B08D052F5FD8445F4BB80A1A5D7BF&aid=45A093785BB8E0234682335A9D3C0C8C&yid=2DD7160C83D0ACED&vid=13553B2D12F347E8&iid=38B194292C032A66&sid=F27A401E323B6FAD&eid=BA48F0B914ED890A&journal_id=1006-7191&journal_name=金属学报(英文版)&referenced_num=0&reference_num=2