%0 Journal Article
%T THE EFFECTS OF NEGATIVE BIAS AND FLUX RATIO ON THE PROPERTIES OF TiN THIN FILMS FORMED BY FILTERED CATHODIC ARC PLASMA TECHNIQUE
%A YJZhang
%A <br>Y.J.Zhang
%A P.X.Yan
%A Z.G.Wu
%A W.W.Zhang
%A J.Wang
%A Q.J.Xue
%J 金属学报(英文版)
%D 2005
%I 
%X The filtered cathodic vacuum-arc (FCVA) technique is a supplementary and alterna tive technique with respect to convendtional physical and chemical vapour deposi tion which can remove macro-particles effectively and make the deposition proces s at ambient temperature. In this work, high quality TiN thin films were deposi ted on silicon substrates at low temperature using the improved filtered cathodi c arc plasma (FCAP) technique. AFM, XRD, TEM were employed to characterize the T iN thin films. The effects of the negative substrate bias on the grain size, pre ferred crystalline orientation, surface roughness of TiN thin films were discuss ed.
%K TiN
%K filtered cathodic arc plasma
%K preferred orientation<br>氮化钛薄膜
%K 滤波阴极电弧等离子体
%K 定向生长
%K 化学蒸气沉积
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=AB188D3B70B071C57EB64E395D864ECE&jid=C19B08D052F5FD8445F4BB80A1A5D7BF&aid=6B1ABB287F603F8461F91C099C1A8F44&yid=2DD7160C83D0ACED&vid=13553B2D12F347E8&iid=38B194292C032A66&sid=F7BB24011DC0D223&eid=5F8BAECF36EB55E2&journal_id=1006-7191&journal_name=金属学报(英文版)&referenced_num=1&reference_num=21