%0 Journal Article
%T PREPARATION AND STRVCTURAL EVOLUTION OF TiO_2 THIN FILMS BY LOW PRESSURE MOCVD<br>PREPARATION AND STRVCTURAL EVOLUTION OF TiO_2 THINFILMS BY LOW PRESSURE MOCVD
%A WJ Li
%A ZM Wu
%A JF Zhao
%A ZH Wu
%A XLZhao
%A BC Cai
%A <br>
%J 金属学报(英文版)
%D 2000
%I 
%X 1. IntroductionTitanium dioxide (TiO2) films are widely used for electrical and optical applications because of its high dielectric constant, its chemical stability and its high refractive i.de.1--2].Tioz thin films can be prepared by various thin film deposition techniquesl3--8]. Amongthese techniques, chemical vapor deposition (CVD) is considered as a useful method to deposit high quality thin films with large area uniformity and well--controlled stoichiometry.Crystalline TiOZ exists th…
%K MOCVD
%K deposition
%K titanium dioxide
%K thin film
%K structural property<br>
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=AB188D3B70B071C57EB64E395D864ECE&jid=C19B08D052F5FD8445F4BB80A1A5D7BF&aid=D746A37FC5A1462BBF7F8CAE2B612901&yid=9806D0D4EAA9BED3&vid=FC0714F8D2EB605D&iid=B31275AF3241DB2D&sid=0EFDF9DD0F63E842&eid=C92F92E9A15D3512&journal_id=1006-7191&journal_name=金属学报(英文版)&referenced_num=0&reference_num=11