%0 Journal Article
%T STOCHASTIC CRACKING AND HEALING BEHAVIORS OF THIN FILMS DURING REACTION-DIFFUSION GROWTH
%A SL Zhu
%A <br>S.L. Zhu
%A S.L. Yang
%A Y.M. Xiong
%A M.S. Li
%A S.J. Geng
%A C.S. Hu
%A Fuhui Wang and W.T. Wu
%J 金属学报(英文版)
%D 2001
%I 
%X The stochastic cracking and healing behaviors of reaction-diffusion growth of thin films were studied by means of Markov processes analysis. We chose the thermal growth of oxide scales on metals as an example of reaction-diffusion growth. The thermal growth of oxide films follows power law when no cracking occurs. Our results showed that the growth kinetics under stochastic cracking and healing conditions was different from that without cracking. It might be altered to either pseudo-linear or pseudo-power laws dependent upon the intensity and frequency of the cracking of the films. When the hoping items dominated, the growth followed pseudo-linear law; when the diffusional items dominated, it followed pseudo-power law with the exponentials lower than the intrinsical values. The numerical results were in good agreement with the meassured kinetics of isothermal and cyclic oxidation of NiAl-0.1 Y (at. %) alloys in air at 1273K.
%K stochastic analysis
%K reaction-diffusion growth
%K oxide films<br>
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=AB188D3B70B071C57EB64E395D864ECE&jid=C19B08D052F5FD8445F4BB80A1A5D7BF&aid=24AA60BFDBBD56183B34A1BAFAC292FA&yid=14E7EF987E4155E6&vid=F3583C8E78166B9E&iid=B31275AF3241DB2D&sid=B34BDD6A690A04C0&eid=E5D85F291CED2DA6&journal_id=1006-7191&journal_name=金属学报(英文版)&referenced_num=0&reference_num=7