%0 Journal Article
%T PERFORMANCE AND MICROSTRUCTURE OF SUPERHARD Si_3N_4 FILM BY HIGH POWER CO_2 LASER CVD
%A FENG Zhongchao GUO Liang LIANG Yong HAN Jian HOU Wanliang NING Xiaoguang Institute of Metal Research
%A Academia Sinica
%A Shenyang
%A China Associate Professor
%A <br>FENG Zhongchao GUO Liang LIANG Yong HAN Jian HOU Wanliang NING Xiaoguang Institute of Metal Research
%A Academia Sinica
%A Shenyang
%A China Associate Professor
%A Institute of Metal Research
%A Academia Sinica
%A Shenyang
%A China
%J 金属学报(英文版)
%D 1993
%I 
%X A superhard α-Si_3N_4 film,deposited on metal substrate,was produced by laser chemicalvapor deposition adopting a kW-level high power CO_2 laser.Most films are composedof fine Si_3N_4 partieles.They join the metal substrate in strong bond.The films havesuper hardness,excellent resistance to wear and corrosion,etc.Their thickness may becontrolled within 5-30 μm.
%K laser chemical vapour deposition
%K Si_3N-4 film
%K hardness
%K wear resistance
%K corrosion resistance<br>
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=AB188D3B70B071C57EB64E395D864ECE&jid=C19B08D052F5FD8445F4BB80A1A5D7BF&aid=A602C7492B3C5B18504F142666D1DF4C&yid=D418FDC97F7C2EBA&vid=B31275AF3241DB2D&iid=DF92D298D3FF1E6E&sid=0401E2DB1F51F8DE&eid=68D88C2FCF9C3098&journal_id=1006-7191&journal_name=金属学报(英文版)&referenced_num=0&reference_num=5