%0 Journal Article
%T MICROSTRUCTURE AND INDENTATION BEHAVIOUR OF MULTILAYER Ti-N FILM
%A WAGENDRISTEL A Viena Technical Univessity
%A AustriaHUANG Rongfang Institute of Metal Research
%A Academia Sinica
%A Shenyang
%A ChinaBANGERT H YANG Xia WU Lihang WANG Haifeng PANGRATZ H SKALICKY P Viena Technical University
%A Austria Associate Professor
%A <br>WAGENDRISTEL A
%A BANGERTH
%A PANGRATZH
%A SKALICKYP
%J 金属学报(英文版)
%D 1993
%I 
%X The microstructure of Ti/TiN multilayer film was studied.It was shown by trans- mission electron microscopy of cross-sectional sample and respective secondary neutrals mass-spectroscopy depth profiling that the film has a periodic alternate multilayered structure:substrate /FeTi/Ti/Ti_2N/TiN/Ti_2N/Ti/Ti_2N/TiN...Ti/Ti_2N/TiN,where FeTi and Ti_2N were the transition layers formed during ion plating.Cross-sectional fracture surface of indentation samples had been obtained and studied with scanning electron microscopy.It was shown that the multilayer film deformed during indentation, formed an indentation pit and a pile-up of materials around the indentation pit.As the applied load increased deformation region extended beyond the film/substratc interface and into the substrate,the interlayer crack in the film and hole formation at the film /substrate interface were initiated.It is also shown that the multilayered Ti/TiN film offered better toughness in comparison with single layer TiN film.
%K multilayer Ti-N film
%K microstructure
%K indentation<br>
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=AB188D3B70B071C57EB64E395D864ECE&jid=C19B08D052F5FD8445F4BB80A1A5D7BF&aid=DA6BF787CABBF1FC1DA46BAEF9B381CF&yid=D418FDC97F7C2EBA&vid=B31275AF3241DB2D&iid=DF92D298D3FF1E6E&sid=771469D9D58C34FF&eid=339D79302DF62549&journal_id=1006-7191&journal_name=金属学报(英文版)&referenced_num=0&reference_num=9