%0 Journal Article
%T Photoelectrochemical Study of the Corrosion and Inhibition on Copper<br>
%A XU Qun-Jie
%A <br>
%J 金属学报
%D 2008
%I 
%X The corrosion behavior of Cu in different concentration of NaCl and the inhibition of PASP were studied by photoelectrochemical method. The copper electrode in a borax buffer solution showed p-type photoresponse which came from Cu2O layer on its surface. When a little NaCl(<0.5g/L) was added, the Cu2O layer didn’t change its semiconductor style; When more NaCl(0.5-15g/L) was added, a part of the Cu2O layer changed into n-type because of the doping of the Cl- . When a large amount of NaCl(>15g/L) was added, the Cu2O layer totally changed into n-type. When the concentration of NaCl was 2g/L, PASP played a competitive adsorption with Cl- and prevented Cu2O layer from being doped, so the Cu2O layer showed p-type. When the concentration of NaCl was 30g/L, the competitive adsorption of PASP only prevented Cu2O layer from doping slightly, the Cu2O layer still changed into n-type, but the n-type was weakened..
%K Copper
%K Photoelectrochemistry
%K Corrosion
%K Inhibitor
%K PASP<br>
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=AB188D3B70B071C57EB64E395D864ECE&jid=B061E1135F1CBDEE96CD96C109FEAD65&aid=A1151125AFCF5EFB13EB872EA705D5B9&yid=67289AFF6305E306&vid=1AE5323881A5ECDC&iid=708DD6B15D2464E8&sid=35D8C930A8A0D2C6&eid=995E04834DE9F169&journal_id=0412-1961&journal_name=金属学报&referenced_num=0&reference_num=0