%0 Journal Article
%T PREPARATION AND MICROSTRUCTURE CHARACTERISTICS OF SUPER-HARD NANOCOMPOSITE Ti-Si-C-N COATING DEPOSITED BY PULSED DC PCVD<br>PCVD制备新型Ti-Si-C-N纳米复合超硬薄膜及其微观结构表征
%A GUOYan
%A CHANG Gengrong
%A MA Shengli
%A XU Kewei
%A <br>郭 岩
%A 畅庚榕
%A 马胜利
%A 徐可为
%J 金属学报
%D 2005
%I 
%X Using an industrial pulsed DC plasma chemical vapor deposition set-up, Ti-Si-C-N coatings were deposited on substrate of high speed steel. The effect of SiCl4 flow rate on chemical composition, microstructure and phases in Ti-Si-C-N coatings was explored by means of XRD, XPS, TEM and SEM. It is suggested that Ti-Si-C-N coatings are of nanocomposite structure composed of nc-Ti(C, N)/a-C/a-Si3N4. The crystalline sizes are in the range of 2-25 nm. When nitrogen content in the coatings was very low, Ti(C, N) changed to TiC and the surface morphologies of Ti-Si-C-N coatings changed from granular grains to strip-shaped grains.
%K Ti-Si-C-N
%K PCVD
%K nanocomposite coating
%K microstructure<br>Ti-Si-C-N
%K PCVD
%K 纳米复合薄膜
%K 微观结构
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=AB188D3B70B071C57EB64E395D864ECE&jid=B061E1135F1CBDEE96CD96C109FEAD65&aid=7A6E97767DBC8A5A&yid=2DD7160C83D0ACED&vid=2001E0D53B7B80EC&iid=9CF7A0430CBB2DFD&sid=80B081C203919926&eid=BB44F42BE8AE7430&journal_id=0412-1961&journal_name=金属学报&referenced_num=0&reference_num=12