%0 Journal Article
%T Impact of Residual Oxygen on Hardness of Nano Structured TiN+Si3N4 Film<br>残余氧对TiN+Si3N4纳米复合薄膜硬度的影响
%A MA Dayan
%A MA Shengli
%A XU Kewei
%A SVeprek
%A <br>马大衍
%A 马胜利
%A 徐可为 S.Veprek
%J 金属学报
%D 2004
%I 
%X Using direct current plasma enhanced chemical vapor deposition (PCVD) techniques, the nanocomposite films of nc-TiN + a-Si3N4 were synthesized. The detrimental effects of residual oxygen on the films hardness were explored. A minor content of residual oxygen can strongly decrease the hardness of the superhard film. Oxygen impurity of 1%-1.5% (atomic fraction) can make the hardness of film decrease to about 30 GPa as compared to 45-55 GPa for the film with below 0.2% oxygen, which is related to the formation of SiOx at interface of crystalline.
%K PCVD
%K TiN
%K Si3N4
%K film
%K hardness
%K oxygen content<br>PCVD
%K TiN
%K Si3N4
%K 薄膜
%K 硬度
%K 氧含量
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=AB188D3B70B071C57EB64E395D864ECE&jid=B061E1135F1CBDEE96CD96C109FEAD65&aid=4796CDCB5D78543B&yid=D0E58B75BFD8E51C&vid=1371F55DA51B6E64&iid=F3090AE9B60B7ED1&sid=1F51A4E3D1D75885&eid=FC27EB98080C89E6&journal_id=0412-1961&journal_name=金属学报&referenced_num=0&reference_num=11