%0 Journal Article
%T EFFECT OF NITROGEN CONTENT ON THE MICROSTRUCTURE AND PROPERTIES OF CNx FILMS DEPOSITED BY PULSED BIAS
%A Hong-Kai LI
%A
%J 金属学报
%D 2008
%I
%K carbon nitride films
%K pulsed bias
%K arc ion plating
%K microstructure
%K properties
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=AB188D3B70B071C57EB64E395D864ECE&jid=B061E1135F1CBDEE96CD96C109FEAD65&aid=F8D8E39FE314D491046E7808CF30E1E0&yid=67289AFF6305E306&vid=1AE5323881A5ECDC&iid=5D311CA918CA9A03&sid=3D9E2C3DB640307A&eid=9BA5B7BDD4CE0596&journal_id=0412-1961&journal_name=金属学报&referenced_num=0&reference_num=0