%0 Journal Article
%T CRYSTAL DEFECTS AND INTERFACE STRUCTURE OF ION-NITRIDED LAYERS<br>离子渗氮层的晶体缺陷和界面结构
%A LI Fengzhao
%A DAI Jiyan
%A LI Douxing Shandong Polytechnic University
%A Jinan
%A Laboratory of Atomic Imaging of Solids
%A <br>孙东升
%A 李凤照
%A 戴吉岩
%A 李斗星
%J 金属学报
%D 1993
%I 
%X 采用高分辨电子显微镜研究了离子渗氮层的晶体缺陷和界面结构结果表明,高速离子的持续轰击将导致大量空位点缺陷的产生,空位的聚合形成空位盘,空位盘的崩塌形成扩展位错,层错四面体等晶体缺陷ε(Fe_(2-3)N)和γ'(Fe_4N)相界面平直、共格,且具有:(111)∥(0001)_ε,110]γ'∥1120]_ε的取向关系
%K crystal defect
%K interface structure
%K ion-nitriding<br>晶体缺陷
%K 界面结构
%K 离子渗氮
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=AB188D3B70B071C57EB64E395D864ECE&jid=B061E1135F1CBDEE96CD96C109FEAD65&aid=963FDFFA261E9A5520AF6254EEF4F11F&yid=D418FDC97F7C2EBA&vid=771469D9D58C34FF&iid=94C357A881DFC066&sid=708DD6B15D2464E8&eid=23CCDDCD68FFCC2F&journal_id=0412-1961&journal_name=金属学报&referenced_num=4&reference_num=4