%0 Journal Article
%T Electrochemical-assisted deposition and protective properties of silane films<br>硅烷膜的阴极电化学辅助沉积及其防护性能
%A ZHANG Weimin
%A HU Jiming
%A <br>张卫明
%A 胡吉明
%J 金属学报
%D 2006
%I 
%X Two types of protective silane films, bis-1, 2-triethoxysilyl] ethane (BTSE) and dodecyltrimethoxysilane (DTMS), were deposited on LY12 aluminum alloys with aiding of electrochemical technique. Electrochemical impedance spectroscopy (EIS) tests show that after silanization the corrosion resistances of Al alloys are increased significantly, especially after deposition at cathodic potentials. A critical deposition potential (CDP), namely -0.8 V, is generally found for each silane system, at which the highest protectiveness is obtained. Scanning electron microscopy (SEM) shows that silane films prepared at CDP display the highest uniformity and density. Applying more positive potentials does not facilitate the film formation. On the other hand, when potential shifts more negative the surface of films presents porous morphology, probably due to the intensive evolving of hydrogen bubbling near the surface. Due to the presence of long hydrophobic Dodecyl chain in bone structure, DTMS films display the best barrier properties.
%K silane film
%K electrochemical-assisted deposition
%K Al alloy
%K corrosion protection<br>硅烷膜
%K 电化学辅助沉积
%K 铝合金
%K 防腐蚀
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=AB188D3B70B071C57EB64E395D864ECE&jid=B061E1135F1CBDEE96CD96C109FEAD65&aid=6689E88E46C541CE&yid=37904DC365DD7266&vid=ECE8E54D6034F642&iid=38B194292C032A66&sid=AF507FDD66D991DA&eid=88D36036CFF69B3C&journal_id=0412-1961&journal_name=金属学报&referenced_num=8&reference_num=19