%0 Journal Article
%T Infrared properties and mechanism of Al-doped ZnO thin films<br>掺铝氧化锌薄膜的红外性能及机制
%A FU Engang
%A Zhuang Daming
%A ZHANG Gong
%A <br>付恩刚
%A 庄大明
%A 张弓
%J 金属学报
%D 2005
%I 
%X Al-doped zinc oxide (ZAO) thin films were prepared by middle-frequency alternative magnetron sputtering with ZAO (ZnO+2%Al2O3) ceramic target. IR (infrared reflection) spectrom-etry was used to examine infrared reflection properties. The influences of film thickness, substrate temperature and argon gas pressure on the performances of ZAO thin films were investigated. The technical parameters for depositing ZAO films with high infrared reflection were determined.
%K magnetron sputtering
%K ZAO thin film
%K infrared reflection<br>磁控溅射
%K ZAO薄膜
%K 红外反射
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=AB188D3B70B071C57EB64E395D864ECE&jid=B061E1135F1CBDEE96CD96C109FEAD65&aid=0E78A5CB457328A4&yid=2DD7160C83D0ACED&vid=2001E0D53B7B80EC&iid=38B194292C032A66&sid=CF6CB42CFF3D4C4E&eid=50EA2A80A7D254EF&journal_id=0412-1961&journal_name=金属学报&referenced_num=6&reference_num=9