%0 Journal Article
%T THE INSPECTION OF DEFECTS IN METAL OXIDE FILMS BY CPCD AND LIQUID CRYSTAL METHODS<br>用临界钝化电流法和液晶法检测金属氧化物膜的缺陷率
%A YIN Renhe
%A CAO Weimin
%A LI Yajun
%A <br>印仁和
%A 曹为民
%A 李亚君
%A 李卓棠
%A 荣国斌
%J 金属学报
%D 1997
%I 
%X The defects in Ta2O5 and ZrO2 films prepared by RF sputtering on SUS304stainless steel were studied by CPCD (critical passivation current density) and liquid crystalmethods. In CPCD method a relation between current density if and film thickness wasgiven: If= K(1-0)d. Using DSM (dynamic scattering mode) of liquid crystal, a new methodabout nondestructive testing of film defects was reported. The results of the two methodsshowed a good linear relation.
%K CPCD method
%K DSM
%K liquid crystal
%K oxide film
%K defect<br>临界钝化电流法
%K 液晶法
%K 氧化物
%K 薄膜
%K 缺陷率
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=AB188D3B70B071C57EB64E395D864ECE&jid=B061E1135F1CBDEE96CD96C109FEAD65&aid=17FA1B7742901161321C8A1EC735B5EF&yid=5370399DC954B911&vid=27746BCEEE58E9DC&iid=B31275AF3241DB2D&sid=06DAE5E1DF7D0B6A&eid=B7DE0F3CA34DA149&journal_id=0412-1961&journal_name=金属学报&referenced_num=0&reference_num=1